We acknowledge financial support from ANPCyT (Argentina), Ministerio de Ciencia y Tecnología (Spain – Project Number BFM2003-07749-C05-2, MAT2000-0375-C02-02), and the CONICET-CSIC cooperation program. O. A. acknowledges a grant from Fundación Antorchas.
Direct Nanopatterning of Metal Surfaces Using Self-Assembled Molecular Films†
Article first published online: 8 MAR 2004
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 16, Issue 5, pages 405–409, March, 2004
How to Cite
Azzaroni, O., Fonticelli, M. H., Benítez, G., Schilardi, P. L., Gago, R., Caretti, I., Vázquez, L. and Salvarezza, R. C. (2004), Direct Nanopatterning of Metal Surfaces Using Self-Assembled Molecular Films. Adv. Mater., 16: 405–409. doi: 10.1002/adma.200306190
- Issue published online: 8 MAR 2004
- Article first published online: 8 MAR 2004
- Manuscript Accepted: 18 DEC 2003
- Manuscript Received: 17 SEP 2003
- Self-assembled monolayers
A new method for direct patterning of metal surfaces with sub-50 nm resolution based on molecular films is described (see Figure). Thermal vapor deposition of different metals on chemically surface-modified nanostructured silicon or metallic masters allows direct pattern transfer and easy film detachment. Patterned metallic surfaces are also used as platforms to grow nanostructured hybrid materials by controlled chemical reactions.