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Keywords:

  • Lithography, Langmuir–Blodgett;
  • Patterning, surface

Self-patterning monolayer films prepared by the Langmuir–Blodgett technique have been used as resists for anisotropic chemical etching of Si 〈100〉. The resulting topographies are transferred onto polymer surfaces to guide the growth of biological cells. This method allows rapid and simple nanolithography of complex nanopatterns over large areas.