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Advanced Materials

Self-Organized Complex Patterning: Langmuir–Blodgett Lithography

Authors


  • We thank C. M. Sotomayor Torres, A. Kam, and B. Moerschbacher for help with the nanoimprinting, N. Gaponik and H. Weller for providing the CdTe nanoparticles, M.-B. Meier and I. Gabriniok for help with the cell culture, M. Gleiche for stimulating discussions and the DFG (SFB 424; DFG WI1769) for the financial support.

Abstract

Self-patterning monolayer films prepared by the Langmuir–Blodgett technique have been used as resists for anisotropic chemical etching of Si 〈100〉. The resulting topographies are transferred onto polymer surfaces to guide the growth of biological cells. This method allows rapid and simple nanolithography of complex nanopatterns over large areas.

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