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Advanced Materials

Magnetic Ceramic Films from a Metallopolymer Resist Using Reactive Ion Etching in a Secondary Magnetic Field

Authors


  • I.M. and C.M.Y. thank the Canadian Government for Canada Research Chairs and the Ontario Government for a PREA Award. I.M. is grateful to U of T for a McLean Fellowship (1997–2003). S.B.C. acknowledges NSERC for a PDF. Z.-H.L. thanks CFI and OIT for equipment grants. C.M.Y. also thanks NSERC, ORDCF, CFI and OIT. M.S.R. is grateful for a Walter C. Sumner Memorial Fellowship. R.N.S.S and P.M.B thank the Canadian Foundation for Innovation, Ontario Innovation Trust, U of T, McMaster University, Celestica and Environment Canada. We thank Prof. Eugenia Kumacheva for the use of the ellipsometer and Dr. Srebri Petrov for useful discussion. I.M. and Z.-H. Lu acknowledge an AGENO grant from NSERC.

Abstract

Magnetic ceramic films containing metal-rich nanoworm reticulations 200–550 nm wide have been fabricated from a highly metallized metallopolymer resist (see Figure) using oxygen or hydrogen plasma reactive ion etching in a secondary magnetic field. Applications may be found in spintronics and logic circuits.

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