Stamps for Submicrometer Soft Lithography Fabricated by Capillary Force Lithography

Authors

  • C. M. Bruinink,

    1. Laboratory of Supramolecular Chemistry and Technology, MESA+ Institute for Nanotechnology, University of Twente , P.O. Box 217, NL-7500 AE Enschede, The Netherlands
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  • M. Péter,

    1. Laboratory of Supramolecular Chemistry and Technology, MESA+ Institute for Nanotechnology, University of Twente , P.O. Box 217, NL-7500 AE Enschede, The Netherlands
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  • M. de Boer,

    1. Transducers Science and Technology group, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands
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  • L. Kuipers,

    1. Strategic Research Orientation ‘Advanced Photonic Structures’, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands
    2. FOM Institute for Atomic and Molecular Physics (AMOLF), Kruislaan 407, NL-1098 SJ Amsterdam, The Netherlands
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  • J. Huskens,

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  • D. N. Reinhoudt


  • This research was supported by the MESA+ Institute for Nanotechnology and is part of the Strategic Research Orientation ‘Advanced Photonic Structures’. Mark A. Smithers of the CMAL/MESA+ is acknowledged for operating the high-resolution SEM.

Abstract

original image

A convenient, inexpensive technique for fabrication of stamps for submicrometer soft lithography from masters with micrometer-size features is presented. Templates fabricated by capillary-force lithography are robust against replica molding of stamps. The Figure shows the resulting metal structure after employing such a second-generation stamp in microcontact printing of octadecanethiol and subsequent wet chemical etching of the underlying gold.

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