Patterning of Substrates Using Surface Relief Structures on an Azobenzene-Functionalized Polymer Film


  • The authors thank the US National Science Foundation (DMR0075170) and US Office of Naval Research (N000149J1148) for financial support.


A maskless method for patterning substrates using surface relief structures on azobenzene-functionalized polymer is demonstrated. Surface relief structures are inscribed on a polymer film spin-coated on an indium tin oxide (ITO) substrate by exposure to an interference pattern. Etching with oxygen plasma followed by a zinc-powder-catalyzed liquid etchant yields a periodically patterned ITO substrate (see Figure).