Advanced Materials

Nanoparticle-Assisted Growth of Porous Germanium Thin Films

Authors


  • This work was supported by the National Science Council in Taiwan. We thank C. C. Hsu and C. H. Yang for TEM and AES analyses, respectively. We also thank Dr. J. M. Shieh and Dr. B. T. Dai for their help with the ICPCVD system. Supporting Information is available online from Wiley Interscience or from the authors.

Abstract

Porous Ge thin films (see Figure) have been prepared using low-pressure, inductively coupled plasma chemical vapor deposition. Au nanoparticles are used as catalysts to initiate the protrusion of Ge nanotips from the surface of the substrate. After removing the catalysts during growth, the Ge nanotips coalesce together to develop the porous structure.

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