Patterned Microstructures of Porous Silicon by Dry-Removal Soft Lithography

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Abstract

A new procedure to directly pattern a luminescent porous silicon substrate by dry-removal soft lithography is outlined. The ability to transfer a removed microstructure of porous silicon to a free-standing flexible polymer film is also demonstrated, and by removing strips in orthogonal directions, an array of PSi pillars is produced (see Figure).

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