Chemically Amplified Positive Resists for Two-Photon Three-Dimensional Microfabrication


  • This research was supported by the National Science Foundation at Cornell University through the Nanobiotechnology Center (ECS-9876771) and at the University of Arizona through the Science and Technology Center for Materials and Devices for Information Technology Research (DMR-010967) and the Chemistry Division (CHE-0107105) and by the AFOSR through the Liquid Crystal MURI (#F49620-97-1-0014). Support from the W. M. Keck Foundation for the purchase of instrumentation used in this research is gratefully acknowledged. The Cornell Nanofabrication Facility is gratefully acknowledged for providing the equipment for initial photolithographic evaluation of the materials.


A simple one-step process to fabricate three- dimensional (3D) microstructures is reported. Based on two-photon excited-state chemistry, a chemically amplified positive tone photoresist has been developed and the lithographic process investigated. The results, as indicated by the fabricated material (see Figure) suggest that positive tone two-photon 3D microfabrication may be a valuable route to precision microfluidic and microoptical devices.