This work was partially financed by the Comunidad Autónoma de Madrid through 07T/0048/2003 and 07N/0059/2002, and Spanish MCyT through MAT2003-01237 projects. We gratefully acknowledge Elizabeth Castillo and Elisa Palacios for bead synthesis and Alfonso R. Alija for help with the SEM experiment.
Selective Formation of Inverted Opals by Electron-Beam Lithography†
Article first published online: 29 OCT 2004
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 16, Issue 19, pages 1732–1736, October, 2004
How to Cite
Juárez, B. H., Golmayo, D., Postigo, P. A. and López, C. (2004), Selective Formation of Inverted Opals by Electron-Beam Lithography. Adv. Mater., 16: 1732–1736. doi: 10.1002/adma.200400285
- Issue published online: 29 OCT 2004
- Article first published online: 29 OCT 2004
- Manuscript Accepted: 27 MAY 2004
- Manuscript Received: 3 JAN 2004
- Chemical vapor deposition (CVD), atmospheric pressure;
- Lithography, electron-beam;
- Photonic crystals, colloidal;
- Poly(methyl methacrylate) (PMMA)
Lateral control of the fabrication of selectively inverted opals using polymer–silica composites is reported. Poly(methyl methacrylate)–SiO2 composite opals obtained by chemical vapor deposition can be patterned by electron-beam lithography and developed to produce silica inverse opals with well-defined extrinsic defects (see Figure).