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Selective Formation of Inverted Opals by Electron-Beam Lithography

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  • This work was partially financed by the Comunidad Autónoma de Madrid through 07T/0048/2003 and 07N/0059/2002, and Spanish MCyT through MAT2003-01237 projects. We gratefully acknowledge Elizabeth Castillo and Elisa Palacios for bead synthesis and Alfonso R. Alija for help with the SEM experiment.

Abstract

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Lateral control of the fabrication of selectively inverted opals using polymer–silica composites is reported. Poly(methyl methacrylate)–SiO2 composite opals obtained by chemical vapor deposition can be patterned by electron-beam lithography and developed to produce silica inverse opals with well-defined extrinsic defects (see Figure).

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