This work was supported by the National Science Foundation (Grant ECS-0088438). J. T. F is a Research Corporation Cottrell Scholar and a Camille Dreyfus Teacher-Scholar.
Photolithographic Patterning of Ring-Opening Metathesis Catalysts on Silicon†
Article first published online: 13 JAN 2005
Copyright © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 17, Issue 1, pages 39–42, January, 2005
How to Cite
Harris, R. F., Ricci, M. J., Farrer, R. A., Praino, J., Miller, S. J., Saleh, B. E. A., Teich, M. C. and Fourkas, J. T. (2005), Photolithographic Patterning of Ring-Opening Metathesis Catalysts on Silicon. Adv. Mater., 17: 39–42. doi: 10.1002/adma.200400311
- Issue published online: 13 JAN 2005
- Article first published online: 13 JAN 2005
- Manuscript Accepted: 8 JUN 2004
- Manuscript Received: 3 MAR 2004
- Patterning, polymers;
Ruthenium-based metathesis catalysts have been successfully covalently bound to a thermal oxide layer on a Si(100) wafer. Selective inactivation of the catalyst is achieved via exposure to UV light using standard photolithographic techniques. Subsequent exposure of the wafer to a suitable monomer results in the formation of a patterned polymeric film that is covalently attached to the oxide layer (see Figure).