This work was supported by the National Science Foundation (Grant ECS-0088438). J. T. F is a Research Corporation Cottrell Scholar and a Camille Dreyfus Teacher-Scholar.
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Communication
Photolithographic Patterning of Ring-Opening Metathesis Catalysts on Silicon†
Article first published online: 13 JAN 2005
DOI: 10.1002/adma.200400311
Copyright © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Harris, R., Ricci, M., Farrer, R., Praino, J., Miller, S., Saleh, B., Teich, M. and Fourkas, J. (2005), Photolithographic Patterning of Ring-Opening Metathesis Catalysts on Silicon. Advanced Materials, 17: 39–42. doi: 10.1002/adma.200400311
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Publication History
- Issue published online: 13 JAN 2005
- Article first published online: 13 JAN 2005
- Manuscript Accepted: 8 JUN 2004
- Manuscript Received: 3 MAR 2004
- Abstract
- References
- Cited By
Keywords:
- Crosslinking;
- Patterning, polymers;
- Photolithography
Graphical Abstract
Ruthenium-based metathesis catalysts have been successfully covalently bound to a thermal oxide layer on a Si(100) wafer. Selective inactivation of the catalyst is achieved via exposure to UV light using standard photolithographic techniques. Subsequent exposure of the wafer to a suitable monomer results in the formation of a patterned polymeric film that is covalently attached to the oxide layer (see Figure).