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Advanced Materials

Photolithographic Patterning of Ring-Opening Metathesis Catalysts on Silicon

Authors


  • This work was supported by the National Science Foundation (Grant ECS-0088438). J. T. F is a Research Corporation Cottrell Scholar and a Camille Dreyfus Teacher-Scholar.

Abstract

Ruthenium-based metathesis catalysts have been successfully covalently bound to a thermal oxide layer on a Si(100) wafer. Selective inactivation of the catalyst is achieved via exposure to UV light using standard photolithographic techniques. Subsequent exposure of the wafer to a suitable monomer results in the formation of a patterned polymeric film that is covalently attached to the oxide layer (see Figure).

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