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Strongly Enhanced Thermal Stability of Crystalline Organic Thin Films Induced by Aluminum Oxide Capping Layers

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  • We acknowledge support by the Deutsche Forschungsgemeinschaft (DFG) within the Focus Program on organic field effect transistors and by the Engineering and Physical Sciences Research Council (EPSRC). We are grateful to the FZ Karlsruhe and the ANKA management for their generous support.

Abstract

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The thermal stability of thin films of di-indenoperylene (DIP), an organic semiconductor is shown via thermal desorption spectroscopy (TDS) and in-situ X-ray diffraction to be strongly enhanced by aluminum oxide capping layers. Possible mechanisms for the eventual breakdown of the film (which remains crystalline up to 460 °C) at high temperatures are discussed (see Figure).

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