Precise Control over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates


  • The authors thank A. Mayes, J. Cheng and M. P. Stoykovich for helpful discussions. This work was supported by the Semiconductor Research Corporation, the National Science Foundation through the Materials Research Science and Engineering Center and the Camille Dreyfus Teacher-Scholar Award. Facility and staff of the CNTech were supported by DARPA and the Intel Corporation and the Synchrotron Radiation Center is supported by the National Science Foundation.


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Epitaxial assembly of block-copolymer films (see Figure) onto chemically nanopatterned substrates results in arrays of nanoscopic domains that are defect-free, oriented, and registered with the underlying substrate. The range of dimensions of features (or periodicity of structures) that can be patterned with perfection and registration strongly depends on the interfacial energy between the substrate and the polymer film.