Communication

Precise Control over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates†

  1. E. W. Edwards1,
  2. M. F. Montague1,
  3. H. H. Solak2,
  4. C. J. Hawker3,
  5. P. F. Nealey

Article first published online: 25 AUG 2004

DOI: 10.1002/adma.200400763

Issue

Advanced Materials

Advanced Materials

Special Issue: Soft Lithography, dedicated to George M. Whitesides

Volume 16, Issue 15, pages 1315–1319, August, 2004

Additional Information

How to Cite

Edwards, E. W., Montague, M. F., Solak, H. H., Hawker, C. J. and Nealey, P. F. (2004), Precise Control over Molecular Dimensions of Block-Copolymer Domains Using the Interfacial Energy of Chemically Nanopatterned Substrates. Adv. Mater., 16: 1315–1319. doi: 10.1002/adma.200400763

Author Information

  1. 1

    Department of Chemical and Biological Engineering and , Center for Nanotechnology , University of Wisconsin , Madison, WI 53706, USA

  2. 2

    Laboratory for Micro- and Nanotechnology, Paul Scherrer Institute, CH-5232 Villigen PSI, Switzerland

  3. 3

    IBM Almaden Research Center, 650 Harry Road, San Jose, CA 95120-6099, USA

  1. †

    The authors thank A. Mayes, J. Cheng and M. P. Stoykovich for helpful discussions. This work was supported by the Semiconductor Research Corporation, the National Science Foundation through the Materials Research Science and Engineering Center and the Camille Dreyfus Teacher-Scholar Award. Facility and staff of the CNTech were supported by DARPA and the Intel Corporation and the Synchrotron Radiation Center is supported by the National Science Foundation.

Publication History

  1. Issue published online: 25 AUG 2004
  2. Article first published online: 25 AUG 2004
  3. Manuscript Received: 15 APR 2004

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