Using Soft Lithography to Pattern Highly Oriented Polyacetylene (HOPA) Films via Solventless Polymerization

Authors


  • This work was supported by the Research Grants Council of Hong Kong and the DuPont Young Faculty Grant.

Abstract

original image

A new application of the combination of soft lithography and solventless polymerization is described (see Figure)—the patterning of ultra-hard microstructures in selected areas using highly oriented polyacetylene (HOPA) films as a precursor. It is expected that this simple, low-cost, and mild process will lead to the formation of highly oriented films of other materials, e.g., electro-optically active polymers.

Ancillary