Communication

Using Soft Lithography to Pattern Highly Oriented Polyacetylene (HOPA) Films via Solventless Polymerization†

  1. H. Gu1,
  2. R. Zheng2,
  3. X. Zhang2,
  4. B. Xu

Article first published online: 25 AUG 2004

DOI: 10.1002/adma.200400768

Issue

Advanced Materials

Advanced Materials

Special Issue: Soft Lithography, dedicated to George M. Whitesides

Volume 16, Issue 15, pages 1356–1359, August, 2004

Additional Information

How to Cite

Gu, H., Zheng, R., Zhang, X. and Xu, B. (2004), Using Soft Lithography to Pattern Highly Oriented Polyacetylene (HOPA) Films via Solventless Polymerization. Adv. Mater., 16: 1356–1359. doi: 10.1002/adma.200400768

Author Information

  1. 1

    Department of Chemistry, The Hong Kong University of Science & Technology, Clear Water Bay, Hong Kong, P.R. China

  2. 2

    Department of Physics, The Hong Kong University of Science & Technology, Clear Water Bay, Hong Kong, P.R. China

  1. †

    This work was supported by the Research Grants Council of Hong Kong and the DuPont Young Faculty Grant.

Publication History

  1. Issue published online: 25 AUG 2004
  2. Article first published online: 25 AUG 2004
  3. Manuscript Received: 15 APR 2004

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Keywords:

  • Patterning;
  • Soft lithography;
  • Solventless polymerization
Thumbnail image of graphical abstract

A new application of the combination of soft lithography and solventless polymerization is described (see Figure)—the patterning of ultra-hard microstructures in selected areas using highly oriented polyacetylene (HOPA) films as a precursor. It is expected that this simple, low-cost, and mild process will lead to the formation of highly oriented films of other materials, e.g., electro-optically active polymers.

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