This work was supported by DARPA under Contract F8650–04-C-7101, the U.S. Department of Energy under grant DEFG02–91-ER45439, the NSF grant DMR-0405208, the NSF grant ECS-0437932 and an NSF NIRT grant. S.-H. Hur acknowledges support from a Korean Science and Engineering Fellowship. Supporting Information is available online from Wiley InterScience or from the author.
Communication
High-Performance n- and p-Type Single-Crystal Organic Transistors with Free-Space Gate Dielectrics†
Article first published online: 16 DEC 2004
DOI: 10.1002/adma.200401017
Copyright © 2004 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Menard, E., Podzorov, V., Hur, S.-H., Gaur, A., Gershenson, M. and Rogers, J. (2004), High-Performance n- and p-Type Single-Crystal Organic Transistors with Free-Space Gate Dielectrics. Advanced Materials, 16: 2097–2101. doi: 10.1002/adma.200401017
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Publication History
- Issue published online: 16 DEC 2004
- Article first published online: 16 DEC 2004
- Manuscript Accepted: 21 SEP 2004
- Manuscript Received: 27 JUN 2004
Keywords:
- Field-effect transistors, organic;
- Single crystals;
- Tetracyanoquinodimethane (TCNQ)
Graphical Abstract

A novel single-crystal organic field-effect transistor (OFET) is described, in which the gate dielectric is replaced by a thin gap that can be occupied by a gas or vacuum. When used in combination with high-quality rubrene or tetracyanoquinodimethane (TCNQ) crystals, n- and p-devices with extremely good mobilities and normalized sub-threshold slopes, representing the ultimate in OFET performance, are realized.

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