This research was supported by a grant (04K1401-01710) from the Center for Nanoscale Mechatronics & Manufacturing, one of the 21st Century Frontier Research Programs, which are supported by Ministry of Science and Technology, Korea. This work was also supported in part by the Micro Thermal System Research Center of Seoul National University. K. Y. Suh thanks Dr. Sangyong Jon for providing the PEG copolymer and Dr. Hyunsik Yoon for providing the original master.
Observation of High-Aspect-Ratio Nanostructures Using Capillary Lithography†
Article first published online: 3 MAR 2005
Copyright © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 17, Issue 5, pages 560–564, March, 2005
How to Cite
Suh, K. Y., Choi, S.-J., Baek, S. J., Kim, T. W. and Langer, R. (2005), Observation of High-Aspect-Ratio Nanostructures Using Capillary Lithography. Adv. Mater., 17: 560–564. doi: 10.1002/adma.200401089
- Issue published online: 3 MAR 2005
- Article first published online: 3 MAR 2005
- Manuscript Accepted: 15 OCT 2004
- Manuscript Received: 9 JUL 2004
- Capillary action;
Several intriguing nanostructures, such as mushroom-like nanopillars, vertical nanopillars (see Figure), and nanospheres, are made using capillary lithography and a new, UV-curable mold consisting of polyurethane functionalized with an acrylate group. An aspect ratio as high as five is achieved for nanopillars 90 nm in diameter.