Room-Temperature, Low-Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers

Authors


  • This work was supported by the NSF grant ECS 0424204 and by AFOSR under a DURIP grant FA9550-04-1-0312.

Abstract

original image

A new UV-curable liquid resist based on cationic polymerization of silicone epoxies has been developed for UV-assisted nanoimprint lithography. Uniform films with thicknesses ranging from below 50 nm to over 1 μm can be easily spin-coated using a suitable undercoating layer on a substrate. Patterns with feature sizes ranging from tens of micrometers to 20 nm (see Figure) are imprinted at room temperature with a pressure of less than 0.1 MPa.

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