Communication

Patterned Gold-Nanoparticle Monolayers Assembled on the Oxide of Silicon†

  1. E. W. Foster,
  2. G. J. Kearns,
  3. S. Goto,
  4. J. E. Hutchison

Article first published online: 7 JUN 2005

DOI: 10.1002/adma.200401728

Issue

Advanced Materials

Advanced Materials

Volume 17, Issue 12, pages 1542–1545, June, 2005

Additional Information

How to Cite

Foster, E. W., Kearns, G. J., Goto, S. and Hutchison, J. E. (2005), Patterned Gold-Nanoparticle Monolayers Assembled on the Oxide of Silicon. Adv. Mater., 17: 1542–1545. doi: 10.1002/adma.200401728

Author Information

  1. Department of Chemistry and Materials Science Institute, University of Oregon, Eugene, OR 97403, USA

  1. †

    The authors thank Christina Inman and John Donovan for their contributions to this work. Funding was provided by the NSF (DGE-0114419) and Sony Corporation of Japan.

Publication History

  1. Issue published online: 7 JUN 2005
  2. Article first published online: 7 JUN 2005
  3. Manuscript Accepted: 10 MAR 2005
  4. Manuscript Received: 20 OCT 2004

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Keywords:

  • Gold;
  • Metal–inorganic hybrid materials;
  • Nanoparticles, metal;
  • Patterning, surface;
  • Silicon
Thumbnail image of graphical abstract

Patterned monolayers of gold nanoparticles are selectively formed on Hf4+-modified silicon dioxide. The 1.5 nm diameter particles are functionalized with a phosphonic acid ligand shell and assembled from solution on a native oxide surface that has been patterned with Hf4+ ions, as shown in the Figure. This system integrates nanoscale components and lithographic patterning. The technique used is precise and compatible with other lithographic techniques.

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