Buried Linear Extrinsic Defects in Colloidal Photonic Crystals

Authors

  • E. Vekris,

    1. Materials Chemistry Research Laboratory, Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario M5S 3H6, Canada
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  • V. Kitaev,

    1. Materials Chemistry Research Laboratory, Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario M5S 3H6, Canada
    2. Current address: Chemistry Department, Wilfrid Laurier University, 75 University Avenue West, Waterloo, Ontario, N2L 3C5, Canada.
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  • G. von Freymann,

    1. Materials Chemistry Research Laboratory, Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario M5S 3H6, Canada
    2. Current address: Institut für Nanotechnologie, Forschungszentrum Karlsruhe in der Helmholtz-Gemeinschaft, D-76021 Karlsruhe, Germany.
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  • D. D. Perovic,

    1. Department of Materials Science and Engineering, University of Toronto, 184 College St., Toronto, Ontario M5S 3E4, Canada
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  • J. S. Aitchison,

    1. Department of Electrical and Computer Engineering, University of Toronto, 10 King's College Rd., Toronto, Ontario M5S 3G4, Canada
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  • G. A. Ozin

    1. Materials Chemistry Research Laboratory, Department of Chemistry, University of Toronto, 80 St. George Street, Toronto, Ontario M5S 3H6, Canada
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  • G. A. O. is Government of Canada Research Chair in Materials Chemistry. He is deeply grateful to the Natural Sciences and Engineering Council of Canada for financial support of this work. D. D. P. gratefully acknowledges financial support from the Canadian Institute for Advanced Research (CIAR). G. v. F. acknowledges support through the Deutsche Forschungsgemeinschaft (DFG) under FR1671/2-1.

Abstract

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Linear extrinsic defects can be embedded inside the lattice of a silica colloidal photonic-crystal film via a directed self-assembly strategy involving a combination of top–down photolithography and bottom–up colloidal assembly. High-spatial-resolution scanning micro-optical spectroscopy proves to be an effective means of characterizing the photonic crystal properties of the buried defects (see Figure) within the film.

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