This work was supported by Agency for Science, Technology and Research (A*STAR) of Singapore. We gratefully thank Dr. Teng Jinghua for his assistance on mask fabrication. Supporting Information is available from Wiley InterScience or from the authors.
Line Defects Embedded in Three-Dimensional Photonic Crystals†
Article first published online: 21 JUL 2005
Copyright © 2005 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 17, Issue 15, pages 1917–1920, August, 2005
How to Cite
Yan, Q., Zhou, Z., Zhao, X. S. and Chua, S. J. (2005), Line Defects Embedded in Three-Dimensional Photonic Crystals. Adv. Mater., 17: 1917–1920. doi: 10.1002/adma.200500047
- Issue published online: 21 JUL 2005
- Article first published online: 21 JUL 2005
- Manuscript Accepted: 29 MAR 2005
- Manuscript Received: 8 JAN 2005
- Defect engineering;
- Photonic crystals, colloidal
Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self-assembled silica colloidal crystal (see Figure and inside cover).