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Keywords:

  • Defect engineering;
  • Photolithography;
  • Photonic crystals, colloidal
Thumbnail image of graphical abstract

Conventional optical photolithography is used to create photoresist patterns on a preformed silica colloidal crystal film. Upon regrowth of the same silica colloidal crystal followed by removal of the photoresist patterns, air–core line defects are successfully introduced into the self-assembled silica colloidal crystal (see Figure and inside cover).