Nanoporous, Ultralow-Dielectric- Constant Fluoropolymer Films from Agglomerated and Crosslinked Hollow Nanospheres of Poly(pentafluorostyrene)-block-Poly(divinylbenzene)



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Nanoporous fluoropolymer films with dielectric constants below 2 are prepared via consecutive surface-initiated atom transfer radical polymerizations of pentafluorostyrene (PFS) and divinylbenzene (DVB) on silica nanospheres. After agglomeration of the nanospheres, crosslinking of the nanospheres by UV, and removal of the silica cores (see Figure), a nanoporous fluoropolymer film with a dielectric constant as low as 1.7 is formed.