Metal-Induced Seeding of Macropore Arrays in Silicon

Authors


  • This work was supported by the Bayerische Forschungsstiftung (FORNANO).

Abstract

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Ordered seed arrays for electrochemical macropore formation can be prepared on silicon surfaces by metal-induced seeding (MIS). A laser interference pattern on an Au-coated Si surface is transferred into a lattice of AuSi eutectic dots during a single intense laser pulse and subsequently developed into spherical pits by Au etching. A substantial advantage of MIS is the possibility to obtain seeding on receded surfaces (see Figure), allowing the incorporation of arrays of microchannels into three-dimensional structures.

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