High-Resolution Patterning of Molecular Glasses Using Supercritical Carbon Dioxide

Authors


  • This work supported by the NSF/Semiconductor Research Corporation Center for Environmentally Benign Semiconductor Manufacturing and Intel. The authors would like to thank the Cornell Nanoscale Facility for the use of equipment.

Abstract

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A glass-forming molecule, consisting of hexa(hydroxyphenyl)benzene [HHPB] protected with six tert-butoxycarbonyl (t-Boc) groups, is patterned and developed to produce features as small as 50 nm (see Figure) using supercritical CO2 (scCO2). Protected HHPB was shown to be completely soluble in scCO2 without incorporation of either fluorine or silicon but could be rendered insoluble in scCO2 by acid-catalyzed removal of the solubilizing t-Boc groups.

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