Advanced Materials

Pattern Registration Between Spherical Block-Copolymer Domains and Topographical Templates

Authors


  • We acknowledge Prof. Edwin L. Thomas for insightful discussions and Mr. Mark Mondol for assistance with lithography. This work was supported by the NSF MRSEC program under award number DMR-0213282, and NSF DMR-0210321.

Abstract

Pattern registration is achieved in thin films of self-assembling block copolymers by using a topographical template to guide the positions of the polymer domains. The placement accuracy of the polymer domains is related to the edge roughness of the topographical template, and the ultimate placement accuracy is assessed (see Figure). For a block copolymer with spherical morphology, a registered polymer array is achieved by using a two-dimensional template.

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