Polymer-Relief Microstructures by Inkjet Etching

Authors

  • B.-J. de Gans,

    1. Laboratory of Macromolecular Chemistry and Nanoscience, Eindhoven University of Technology and Dutch Polymer Institute (DPI), PO Box 513, 5600 MB Eindhoven, The Netherlands
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  • S. Hoeppener,

    1. Laboratory of Macromolecular Chemistry and Nanoscience, Eindhoven University of Technology and Dutch Polymer Institute (DPI), PO Box 513, 5600 MB Eindhoven, The Netherlands
    2. Center for NanoScience, Photonics and Optoelectronic Group, Ludwig-Maximilians-Universität, Geschwister-Scholl-Platz 1, 80539 München, Germany
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  • U. S. Schubert

    1. Laboratory of Macromolecular Chemistry and Nanoscience, Eindhoven University of Technology and Dutch Polymer Institute (DPI), PO Box 513, 5600 MB Eindhoven, The Netherlands
    2. Center for NanoScience, Photonics and Optoelectronic Group, Ludwig-Maximilians-Universität, Geschwister-Scholl-Platz 1, 80539 München, Germany
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  • The research of Berend-Jan de Gans forms part of the research program of the Dutch Polymer Institute (DPI). The authors thank NWO (VICI award for USS) and the Fond der Chemischen Industrie for financial support.

Abstract

original image

Polymer microstructures are prepared by inkjet etching. By varying the distance between the printed solvent droplets, rectangular and honeycomb hole arrays like those shown in the figure are formed. These holes can act as reservoirs for other inkjet-printed materials, such as quantum dots. The technique holds promise for rapid- prototyping applications and microarray fabrication.

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