Fruitful discussions with Dr. Dar-Bin Shieh are gratefully acknowledged. This research was funded by the National Science Council of Taiwan under contract no. 93-2120-M-001-005. Supporting Information is available online from Wiley InterScience or from the author.
DNA as an Electron-Beam-Sensitive Reagent for Nanopatterning†
Article first published online: 18 MAY 2006
Copyright © 2006 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 18, Issue 12, pages 1517–1520, June, 2006
How to Cite
Lin, H.-Y., Tsai, L.-C., Chi, P.-Y. and Chen, C.-D. (2006), DNA as an Electron-Beam-Sensitive Reagent for Nanopatterning. Adv. Mater., 18: 1517–1520. doi: 10.1002/adma.200502083
- Issue published online: 20 JUN 2006
- Article first published online: 18 MAY 2006
- Manuscript Accepted: 11 MAR 2006
- Manuscript Received: 30 SEP 2005
Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2006/c2083_s.pdf or from the author.
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