Single-Step Fabrication of Nickel Films with Arrayed Macropores and Nanostructured Skeletons

Authors


  • This work was supported in part by the Semiconductor Research Corporation under contract 2001-NJ-936 and in part by the National Science Foundation under contract ECS-0120368.

Abstract

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By simple immersion of high-aspect-ratio macroporous silicon in a prepared nickel bath, replication is achieved in a single step via whole nickel displacement over the silicon of pore sidewalls while maintaining the original macroporous structure. The resultant nickel sidewall skeletons are nanocrystalline and nanoporous. The as-formed featured nickel films are able to self-peel from underneath the nonporous silicon base. The figure shows the Ni wall between two pores.

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