Advanced Materials

An Approach to Lithographically Defined Self-Assembled Nanoparticle Films

Authors

  • D. Xia,

    1. Center for High Technology Materials and Electrical and Computer Engineering Department, University of New Mexico, 1313 Goddard SE, Albuquerque, NM 87106, USA
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  • D. Li,

    1. Center for High Technology Materials and Electrical and Computer Engineering Department, University of New Mexico, 1313 Goddard SE, Albuquerque, NM 87106, USA
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  • Y. Luo,

    1. Center for High Technology Materials and Electrical and Computer Engineering Department, University of New Mexico, 1313 Goddard SE, Albuquerque, NM 87106, USA
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  • S. R. J. Brueck

    1. Center for High Technology Materials, Departments of Electrical and Computer Engineering and Physics and Astronomy, University of New Mexico, 1313 Goddard SE, Albuquerque, NM 87106, USA
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  • This work was supported by the ARO/MURI in Deep Subwavelength Optical Nanolithography and by the DARPA University Photonics Centers.

Abstract

Lithographically defined nanoparticle films with high quality and excellent uniformity have been fabricated using a combination of bottom-up self-assembly and top-down interferometic lithography. Using this simple, fast, and versatile approach, various 1D and 2D mesoscopic patterns of silica nanoparticle films are easily fabricated over a large area with nanometer-scale periodicity (see figure).

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