Inside Front Cover: Line Defects Embedded in Three-Dimensional Photonic Crystals (Adv. Mater. 15/2005)



The inside cover illustrates an approach to creating line defects embedded in the interior of a self-assembled photonic crystal, as reported by Zhao and co-workers on p. 1917. Photoresist patterns are first constructed on the surface of a silica opal film by conventional optical photolithography. After regrowth of the silica colloidal crystal, photoresist line defects are successfully introduced into the self-assembled silica colloidal crystal. Further processing results in an inverse opal with air-core line defects embedded in its interior, which provides a prototype for future optical waveguide devices based on self-assembled three-dimensional photonic crystals.