Hybrid Approaches to Nanolithography: Photolithographic Structures with Precise, Controllable Nanometer-Scale Spacings Created by Molecular Rulers

Authors

  • M. E. Anderson,

    1. Departments of Chemistry and Physics, The Pennsylvania State University, University Park, PA 16802, USA
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  • M. Mihok,

    1. Departments of Chemistry and Physics, The Pennsylvania State University, University Park, PA 16802, USA
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  • H. Tanaka,

    1. Departments of Chemistry and Physics, The Pennsylvania State University, University Park, PA 16802, USA
    2. Current address: Research Center for Molecular-Scale Nanoscience, Institute for Molecular Science, National Institutes for Natural Science, 5-1 Higashiyama, Myodaiji, Okazaki 444-8787, Japan
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  • L.-P. Tan,

    1. Department of Engineering Science and Mechanics, The Pennsylvania State University, University Park, PA 16802, USA
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  • M. W. Horn,

    1. Department of Engineering Science and Mechanics, The Pennsylvania State University, University Park, PA 16802, USA
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  • G. S. McCarty,

    1. Penn State Nanofabrication Facility/Materials Research Institute and Department of Engineering Science and Mechanics, The Pennsylvania State University, University Park, PA 16802, USA
    2. Current address: North Carolina State University and University of North Carolina Chapel Hill, 2140 Burlington Nuclear Engineering Laboratories, North Carolina State University, Raleigh, NC 27695, USA
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  • P. S. Weiss

    1. Departments of Chemistry and Physics, The Pennsylvania State University, University Park, PA 16802, USA
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  • This research has been funded by the Air Force Office of Scientific Research, Army Research Office, Defense Advanced Research Projects Agency, National Science Foundation, National Institute of Standards & Technology, Office of Naval Research, Penn State Materials Research Institute, Penn State Nanofabrication Facility, and the Penn State node of the NSF-funded Materials Research Science and Engineering Center. Components of this work were conducted at the Penn State branch of the NSF-funded National Nanotechnology Infrastructure Network. The authors thank Anat Hatzor, David Allara, Weiss group members, and the Penn State Nanofabrication Center staff for helpful interactions and discussions.

Abstract

original image

A hybrid approach to nanolithography combines conventional lithography with chemical self-assembly to yield aligned microstructures with tailored nanoscale spacings (see figure). Self-assembled multilayers form precise resists to create hierarchical nanostructures with the controlled orientation and dimensions necessary for nanoscale device fabrication.

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