Nanoimprint Lithography: Methods and Material Requirements

Authors


  • It is a great pleasure to acknowledge many wonderful students, postdoctoral fellows, and colleagues who have contributed to the work described in this article. This review is dedicated to all of them. Special thanks to Dr. Peng-Fei Fu at Dow Corning Corporation (USA) for the recent collaborations on the development of new materials for nanoimprint technology. This work was supported by NSF grants ECS-0424204 and ECS-0508252, AFOSR grant FA9550-04-1-0312, and NSFC grant No. 60528003.

Abstract

Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.

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