It is a great pleasure to acknowledge many wonderful students, postdoctoral fellows, and colleagues who have contributed to the work described in this article. This review is dedicated to all of them. Special thanks to Dr. Peng-Fei Fu at Dow Corning Corporation (USA) for the recent collaborations on the development of new materials for nanoimprint technology. This work was supported by NSF grants ECS-0424204 and ECS-0508252, AFOSR grant FA9550-04-1-0312, and NSFC grant No. 60528003.
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Review
Nanoimprint Lithography: Methods and Material Requirements†
Article first published online: 25 JAN 2007
DOI: 10.1002/adma.200600882
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Guo, L. (2007), Nanoimprint Lithography: Methods and Material Requirements. Advanced Materials, 19: 495–513. doi: 10.1002/adma.200600882
- †
Publication History
- Issue published online: 9 FEB 2007
- Article first published online: 25 JAN 2007
- Manuscript Revised: 8 AUG 2006
- Manuscript Received: 24 APR 2006
Funded by
- NSF. Grant Numbers: ECS-0424204, ECS-0508252
- AFOSR. Grant Number: FA9550-04-1-0312
- NSFC. Grant Number: 60528003
- Abstract
- References
- Cited By
Keywords:
- Hierarchical structures;
- Molding;
- Nanolithography;
- Nanopatterning;
- Surface patterning
Graphical Abstract
Nanoimprint lithography (see figure) is an emerging lithographic technique for high-throughput patterning of polymer nanostructures at high resolutions and low costs. This Review article considers the basic principles of nanoimprinting, with an emphasis on the requirements placed on materials to allow successful and reliable nanostructure replication.
Abstract
Nanoimprint lithography (NIL) is a nonconventional lithographic technique for high-throughput patterning of polymer nanostructures at great precision and at low costs. Unlike traditional lithographic approaches, which achieve pattern definition through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the resist material and can therefore achieve resolutions beyond the limitations set by light diffraction or beam scattering that are encountered in conventional techniques. This Review covers the basic principles of nanoimprinting, with an emphasis on the requirements on materials for the imprinting mold, surface properties, and resist materials for successful and reliable nanostructure replication.