Rapid Fabrication of Uniformly Sized Nanopores and Nanopore Arrays for Parallel DNA Analysis


  • Meni Wanunu and Min Jun Kim both contributed equally to this work. This work was supported by the National Science Foundation grant NIRT 0403891, and the National Institute of Health grant HG 003574. The authors thank staff from the Center for Nanoscale Systems (CNS) and the Rowland Institute at Harvard for technical assistance. We acknowledge stimulating conversations with Dr. S. Lemay and Dr. D. Krapf in the initial phase of the research, and Dr. K. Murata for his assistance in TEM tomography.


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Rapid fabrication of uniform nanopores and nanopore arrays in Si3N4membranes (see figure) is achieved using a high-intensity electron beam. Expansion or contraction of the pores under electron-beam irradiation is observed and utilized for the controlled fabrication of highly uniform nanopores in the size range 2–20 nm. Our nanopores exhibit a truncated double-cone structure, as revealed by 3D-TEM tomography.