SEARCH

SEARCH BY CITATION

Keywords:

  • DNA;
  • Electron-beam lithography;
  • Membranes;
  • Nanoporous materials;
  • Sensors;
  • Silicon nitride
Thumbnail image of graphical abstract

Rapid fabrication of uniform nanopores and nanopore arrays in Si3N4membranes (see figure) is achieved using a high-intensity electron beam. Expansion or contraction of the pores under electron-beam irradiation is observed and utilized for the controlled fabrication of highly uniform nanopores in the size range 2–20 nm. Our nanopores exhibit a truncated double-cone structure, as revealed by 3D-TEM tomography.