Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning


  • This research has been funded by the Air Force Office of Scientific Research, Army Research Office, Defense Advanced Research Projects Agency, National Science Foundation, National Institute of Standards & Technology, Office of Naval Research, Penn State Materials Research Institute, and the Penn State Center for Nanoscale Science, an NSF-funded Materials Research Science and Engineering Center. Components of this work were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors thank the Weiss group members and the Penn State Nanofabrication Center staff for helpful interactions and discussions.


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An innovative method to obtain chemical patterns with tailored functionality and directed alignment is described (see figure). The patterns are generated by employing lithographic processing, which is compatible with molecular self-assembly and capable of withstanding photo-oxidation. The robust lithographic resist protects against cross- contamination, permitting several self-assembled monolayers terminated with different functional groups to be patterned.