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Combining Conventional Lithography with Molecular Self-Assembly for Chemical Patterning

Authors


  • This research has been funded by the Air Force Office of Scientific Research, Army Research Office, Defense Advanced Research Projects Agency, National Science Foundation, National Institute of Standards & Technology, Office of Naval Research, Penn State Materials Research Institute, and the Penn State Center for Nanoscale Science, an NSF-funded Materials Research Science and Engineering Center. Components of this work were conducted at the Penn State node of the NSF-funded National Nanotechnology Infrastructure Network. The authors thank the Weiss group members and the Penn State Nanofabrication Center staff for helpful interactions and discussions.

Abstract

original image

An innovative method to obtain chemical patterns with tailored functionality and directed alignment is described (see figure). The patterns are generated by employing lithographic processing, which is compatible with molecular self-assembly and capable of withstanding photo-oxidation. The robust lithographic resist protects against cross- contamination, permitting several self-assembled monolayers terminated with different functional groups to be patterned.

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