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Antiadhesion Surface Treatments of Molds for High-Resolution Unconventional Lithography

Authors

  • M. J. Lee,

    1. Center for Intelligent Nano-Bio Materials, Division of Nano Sciences (BK 21) and Department of Chemistry, Ewha Womans University, 11-1 Daehyun-dong, Seodaemun-gu, Seoul 120-750, Korea
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    • M.J.L. and N.Y.L. contributed equally to this work.

  • N. Y. Lee,

    1. Center for Intelligent Nano-Bio Materials, Division of Nano Sciences (BK 21) and Department of Chemistry, Ewha Womans University, 11-1 Daehyun-dong, Seodaemun-gu, Seoul 120-750, Korea
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    • M.J.L. and N.Y.L. contributed equally to this work.

  • J. R. Lim,

    1. Center for Intelligent Nano-Bio Materials, Division of Nano Sciences (BK 21) and Department of Chemistry, Ewha Womans University, 11-1 Daehyun-dong, Seodaemun-gu, Seoul 120-750, Korea
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  • J. B. Kim,

    1. Department of Metallurgical System Engineering (BK 21), Yonsei University, 134 Shinchon-dong, Seodaemun-gu, Seoul 120-749, Korea
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  • M. Kim,

    1. Center for Intelligent Nano-Bio Materials, Division of Nano Sciences (BK 21) and Department of Chemistry, Ewha Womans University, 11-1 Daehyun-dong, Seodaemun-gu, Seoul 120-750, Korea
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  • H. K. Baik,

    1. Department of Metallurgical System Engineering (BK 21), Yonsei University, 134 Shinchon-dong, Seodaemun-gu, Seoul 120-749, Korea
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  • Y. S. Kim

    1. Center for Intelligent Nano-Bio Materials, Division of Nano Sciences (BK 21) and Department of Chemistry, Ewha Womans University, 11-1 Daehyun-dong, Seodaemun-gu, Seoul 120-750, Korea
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  • This work was supported by the SRC program of MOST/KOSEF through the Center for Intelligent Nano-Bio Materials at Ewha Womans University (Grant #: R11-2005-008-00000-0) and the Basic Research Program of the Korea Science and Engineering Foundation (KOSEF, Grant #: R01-2006-000-11066-0). Authors are supported by the Brain Korea 21 (BK 21) fellowship from the Ministry of Education of Korea.

Abstract

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A new strategy to achieve antiadhesion surface coatings is introduced. The approach, which uses molds coated in a thin film of poly(dimethylsiloxane) (PDMS, see figure) to achieve the antiadhesive surfaces, is applicable to virtually any type of mold material due to the use of silane chemistry and the low surface energy of PDMS. This allows simple and rapid replication of high complexity, high-aspect-ratio nanostructures with excellent replication fidelity.

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