Directed Assembly of Lamellae- Forming Block Copolymers by Using Chemically and Topographically Patterned Substrates


  • The authors thank S. Dhuey for performing electron beam patterning. This work was supported by the Semiconductor Research Corporation (SRC) (2005-OC-985) and the National Science Foundation (NSF) through the Nanoscale Science and Engineering Center (DMR-0425880). This work was based in part upon research conducted at the Synchrotron Radiation Center, University of Wisconsin-Madison, which is supported by the NSF under Award No. DMR-0537588. M.P.S. acknowledges a SRC graduate fellowship. The authors also acknowledge support of the IBM Microelectronics Research Laboratory for assistance in sample fabrication.


original image

Lamellae-forming polystyrene-block-poly(methyl methacrylate) films were directed to assemble with perpendicularly oriented domains and long-range order in confining grooves (see figure), with preferential and neutral wetting in sidewalls and bottoms, respectively. The assembled films were highly amenable for pattern transfer by reactive-ion etching.