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Keywords:

  • Block copolymers;
  • Lamellea;
  • Patterning;
  • Poly(methyl methacrylate);
  • Polymeric materials;
  • Polystyrene;
  • Template-assisted assembly
Thumbnail image of graphical abstract

Lamellae-forming polystyrene-block-poly(methyl methacrylate) films were directed to assemble with perpendicularly oriented domains and long-range order in confining grooves (see figure), with preferential and neutral wetting in sidewalls and bottoms, respectively. The assembled films were highly amenable for pattern transfer by reactive-ion etching.