We thank Dr. S. Mendach, Dr. C. Deneke, Dr. M. Stoffel, and Dr. A. Rastelli for helpful discussions, and U. Waizmann, A. Schulz, E. Coric, W. Winter, U. Zschieschang, and M. Riek for experimental assistance. We also thank Dr. Thamm at Karl Zeiss AG for use of the Axiocam HSm. This work is financially supported by the BMBF (03N8711). Supporting Information is available online from Wiley InterScience or from the author.
Semiconductor Sub-Micro-/ Nanochannel Networks by Deterministic Layer Wrinkling†
Article first published online: 12 JUL 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 19, Issue 16, pages 2124–2128, August, 2007
How to Cite
Mei, Y., Thurmer, D. J., Cavallo, F., Kiravittaya, S. and Schmidt, O. G. (2007), Semiconductor Sub-Micro-/ Nanochannel Networks by Deterministic Layer Wrinkling. Adv. Mater., 19: 2124–2128. doi: 10.1002/adma.200601622
- Issue published online: 14 AUG 2007
- Article first published online: 12 JUL 2007
- Manuscript Revised: 7 DEC 2006
- Manuscript Received: 19 JUL 2006
- BMBF. Grant Number: 03N8711
- Microfluidic systems;
- Surface patterning;
- Thin films
Semiconductor micro-/nanochannel networks are developed by deterministic layer wrinkling and applied into a fluidics study. Both linear (see figure) and circular nanochannel networks, consisting of a main channel and several perpendicularly oriented branch channels, are created, where the periodicity and position of the branch channels can be tuned and controlled by changing the width of the partially released layers and by applying appropriate lithography.