Advanced Materials

Nanoscale Deposition of Single-Molecule Magnets onto SiO2 Patterns

Authors


  • We thank Carmen Serra for XPS and ToF-SIMS measurements and Marta Tello and Fabio Biscarini for useful suggestions. This work was supported by the EU Integrated Project NAIMO (NMP4-CT-2004-500355), MRTN-CT-2003-504880 (QuEMolNa), and FP6-515767-2 (MagMaNet NoE). Financial support from the MEC (Spain) (MAT2004-03849 and MAT2003-02655) and Generalitat Valenciana is also acknowledged. Supporting Information is available online from Wiley InterScience or from the author.

Abstract

Manipulation of molecules with nanoscale accuracy is important in nanotechnology. In the novel process reported here, electrostatic interactions direct the deposition of polycationic Mn12 single-molecule magnets into a predefined region of a 1 cm2 silicon chip with 40 nm accuracy (see figure). The process is based on the integration of local oxidation nanolithography with surface functionalization of the Si substrate.

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