Advanced Materials

Nanolayer Patterning Based on Surface Modification with Extreme Ultraviolet Light

Authors

  • S. W. Moon,

    1. Department of Physics, Pohang University of Science and Technology (POSTECH), Pohang 790-784 (Korea)
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  • C. Jeon,

    1. BK21 Physics Research Division, Center for Nanotubes and Nanostructured Composites (CNNC), Institute of Basic Science, and Sungkyunkwan University Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon 440-746 (Korea)
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  • H.-N. Hwang,

    1. Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784 (Korea)
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  • C.-C. Hwang,

    1. Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784 (Korea)
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  • H. J. Song,

    1. Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784 (Korea)
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  • H.-J. Shin,

    1. Beamline Research Division, Pohang Accelerator Laboratory (PAL), Pohang University of Science and Technology (POSTECH), Pohang 790-784 (Korea)
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  • S. Chung,

    1. Department of Physics, Pohang University of Science and Technology (POSTECH), Pohang 790-784 (Korea)
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  • C.-Y. Park

    1. BK21 Physics Research Division, Center for Nanotubes and Nanostructured Composites (CNNC), Institute of Basic Science, and Sungkyunkwan University Advanced Institute of Nano Technology (SAINT), Sungkyunkwan University, Suwon 440-746 (Korea)
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  • This work was supported in part by a grant funded by the Ministry of Commerce, Industry, and Energy of the Korean government (Self-Assembled Nanostructure on the Nanopatterned Surface) and by the SRC program (Center for Nanotubes and Nanostructured Composites) of MOST/KOSEF. C.-C. Hwang acknowledges financial support from the Korea Research Foundation Grant (KRF-2003-015-C00147). Experiments at PLS were supported in part by the MOST and POSTECH.

Abstract

Chlorine nanolayers can be modified by extreme UV (EUV) irradiation, which can be applied to the fabrication of various surface functional-group patterns (see igure) owing to the striking contrast in reactivity between EUV-exposed and -unexposed regions. The technique provides flexibility of surface functionalization and may be applicable to the manufacture of electronic, photonic, and biomolecular nanodevices.

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