We acknowledge discussions with T. Taubner, N. Ocelic, and M. Brehm. Supported by BMBF within the young scientist competition in nanotechnology 2002.
Simultaneous IR Material Recognition and Conductivity Mapping by Nanoscale Near-Field Microscopy†
Article first published online: 2 AUG 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 19, Issue 17, pages 2209–2212, September, 2007
How to Cite
Huber, A. J., Kazantsev, D., Keilmann, F., Wittborn, J. and Hillenbrand, R. (2007), Simultaneous IR Material Recognition and Conductivity Mapping by Nanoscale Near-Field Microscopy. Adv. Mater., 19: 2209–2212. doi: 10.1002/adma.200602303
- Issue published online: 27 AUG 2007
- Article first published online: 2 AUG 2007
- Manuscript Revised: 14 MAR 2007
- Manuscript Received: 10 OCT 2006
- Conductivity, electrical;
- Scanning probe microscopy
IR scattering-type near-field microscopy is applied to simultaneously map material composition and conduction properties in cross-sectional samples of industrial bipolar and metal-oxide- semiconductor devices with nanoscale spatial resolution. Within a single mid-IR image, all relevant materials such as metals, Si, Si3N4, and oxides can be identified by material-specific amplitude and phase contrasts.