This work was supported by the Semiconductor Research Corporation, the UW-NSF Nanoscale Science and Engineering Center (DMR-0425880), and the center on Functional Engineered Nano Architectonics (FENA).
Communication
Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation†
Article first published online: 21 NOV 2007
DOI: 10.1002/adma.200602708
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Additional Information
How to Cite
Han, E., In, I., Park, S.-M., La, Y.-H., Wang, Y., Nealey, P. F. and Gopalan, P. (2007), Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation. Adv. Mater., 19: 4448–4452. doi: 10.1002/adma.200602708
- †
Publication History
- Issue published online: 11 DEC 2007
- Article first published online: 21 NOV 2007
- Manuscript Revised: 19 APR 2007
- Manuscript Received: 27 NOV 2006
Funded by
- Semiconductor Research Corporation
- UW-NSF Nanoscale Science and Engineering Center. Grant Number: DMR-0425880
- Functional Engineered Nano Architectonics (FENA)
- Abstract
- References
- Cited By
Keywords:
- Block copolymers;
- Lithography;
- Semiconductors;
- Thin films

An ultrathin photo-crosslinkable random copolymer film was designed as a substrate-independent imaging layer for block copolymer (BCP) thin films. Negative-tone resist chemistry was combined with the chemistry of neutral surfaces to formulate the imaging layer. The synthesis of the imaging layer, optimization of the photo-crosslinking conditions, and patterning of BCP thin films on the imaging layer is discussed. The mild room temperature crosslinking chemistry is especially attractive for BCPs containing temperature-sensitive monomers.

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