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Photopatternable Imaging Layers for Controlling Block Copolymer Microdomain Orientation


  • This work was supported by the Semiconductor Research Corporation, the UW-NSF Nanoscale Science and Engineering Center (DMR-0425880), and the center on Functional Engineered Nano Architectonics (FENA).


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An ultrathin photo-crosslinkable random copolymer film was designed as a substrate-independent imaging layer for block copolymer (BCP) thin films. Negative-tone resist chemistry was combined with the chemistry of neutral surfaces to formulate the imaging layer. The synthesis of the imaging layer, optimization of the photo-crosslinking conditions, and patterning of BCP thin films on the imaging layer is discussed. The mild room temperature crosslinking chemistry is especially attractive for BCPs containing temperature-sensitive monomers.

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