An ultrathin photo-crosslinkable random copolymer film was designed as a substrate-independent imaging layer for block copolymer (BCP) thin films. Negative-tone resist chemistry was combined with the chemistry of neutral surfaces to formulate the imaging layer. The synthesis of the imaging layer, optimization of the photo-crosslinking conditions, and patterning of BCP thin films on the imaging layer is discussed. The mild room temperature crosslinking chemistry is especially attractive for BCPs containing temperature-sensitive monomers.
If you can't find a tool you're looking for, please click the link at the top of the page to "Go to old article view". Alternatively, view our Knowledge Base articles for additional help. Your feedback is important to us, so please let us know if you have comments or ideas for improvement.