The authors acknowledge support from the Interconnect Focus Center, one of five research centers funded under the Focus Center Research Program, a Semiconductor Research Corporation program.
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Communication
Ultrathick Freestanding Aligned Carbon Nanotube Films†
Article first published online: 25 SEP 2007
DOI: 10.1002/adma.200602974
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Issue
Advanced Materials
Special Issue: Special Section on Bionanotechnology
Volume 19, Issue 20, pages 3300–3303, October, 2007
Additional Information
How to Cite
Ci, L., Manikoth, S. M., Li, X., Vajtai, R. and Ajayan, P. M. (2007), Ultrathick Freestanding Aligned Carbon Nanotube Films. Adv. Mater., 19: 3300–3303. doi: 10.1002/adma.200602974
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Publication History
- Issue published online: 17 OCT 2007
- Article first published online: 25 SEP 2007
- Manuscript Revised: 26 JUN 2007
- Manuscript Received: 28 DEC 2006
Funded by
- Interconnect Focus Center
- Semiconductor Research Corporation
- Abstract
- References
- Cited By
Keywords:
- Carbon nanotubes, multiwalled;
- Chemical vapor deposition;
- Supercapacitors;
- Superhydrophobicity;
- Thin films, nanostructured
A self-releasing technique combining the catalytic growth of carbon nanotubes by chemical vapor deposition with an oxidation step is used to obtain ultrathick freestanding carbon nanotube films. Several millimeter thick films, such as the one depicted in the figure, are grown by controlling the gas flow rates and the catalyst deposition process. The freestanding nanotube films are used as supercapacitors and superhydrophobic surfaces.