We thank Dr. C. L. Hwang of the Material and Chemical Research Laboratories, Industrial Technology Research Institute, for his help in the growth of CNTs by CVD. We also thank Mr. C.-H. Fu of Display Technology Center, Industrial Technology Research Institute for his help in the setup of two-electrode CNT devices and measurements of field-emission properties. Supporting Information is available online from Wiley InterScience or from the author.
Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition†
Version of Record online: 5 NOV 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 19, Issue 21, pages 3584–3588, November, 2007
How to Cite
Tseng, Y.-T., Tseng, W.-H., Lin, C.-H. and Ho, R.-M. (2007), Fabrication of Double-Length-Scale Patterns via Lithography, Block Copolymer Templating, and Electrodeposition. Adv. Mater., 19: 3584–3588. doi: 10.1002/adma.200700042
- Issue online: 5 NOV 2007
- Version of Record online: 5 NOV 2007
- Manuscript Revised: 7 AUG 2007
- Manuscript Received: 4 JAN 2007
Supporting information for this article is available on the WWW under http://www.wiley-vch.de/contents/jc_2089/2007/c0042_s.pdf or from the author.
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