Communication

High-Throughput Synthesis of Anisotropic Colloids via Holographic Lithography†

  1. J. H. Moon1,
  2. A. J. Kim2,
  3. J. C. Crocker2,
  4. S. Yang1

Article first published online: 9 AUG 2007

DOI: 10.1002/adma.200700543

Issue

Advanced Materials

Advanced Materials

Volume 19, Issue 18, pages 2508–2512, September, 2007

Additional Information

How to Cite

Moon, J. H., Kim, A. J., Crocker, J. C. and Yang, S. (2007), High-Throughput Synthesis of Anisotropic Colloids via Holographic Lithography. Adv. Mater., 19: 2508–2512. doi: 10.1002/adma.200700543

Author Information

  1. 1

    Department of Materials Science and Engineering, University of Pennsylvania, 3231 Walnut Street, Philadelphia, PA 19104 (USA)

  2. 2

    Department of Chemical and Biomolecular Engineering, University of Pennsylvania, 220 South 33rd Street, Philadelphia, PA 19104 (USA)

  1. †

    This research was supported by NSF/MRSEC under Award DMR-0520020 and the Office of Naval Research (ONR), Grant N00014-05-0303. S.Y. is also thankful for the 3M Nontenured Faculty Grant. J.H.M. acknowledges support from the Korea Research Foundation postdoctoral fellowship (Grant KRF-2005-000-10299). A.J.K. acknowledges support from the NSF/NIRT program under Award CBET-0404259. We thank Dr. Young-Sang Cho (New York University) for Zeta potential measurements. We acknowledge the use of the Materials Characterization Facility in the Penn Regional Nanotechnology Facility.

Publication History

  1. Issue published online: 10 SEP 2007
  2. Article first published online: 9 AUG 2007
  3. Manuscript Revised: 6 MAR 2007
  4. Manuscript Received: 5 MAR 2007

Funded by

  • NSF/MRSEC. Grant Number: DMR-0520020
  • Office of Naval Research. Grant Number: N00014-05-0303
  • 3M Nontenured Faculty Grant
  • Korea Research Foundation postdoctoral fellowship. Grant Number: KRF-2005-000-10299
  • NSF/NIRT. Grant Number: CBET-0404259

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Keywords:

  • Colloids;
  • Lithography;
  • Synthesis
Thumbnail image of graphical abstract

Monodisperse anisotropic colloids are synthesized (see figure) via holographic lithography and using chemically amplified photoresists. The holographic lithography offers a high-throughput and flexible route to produce particles. To engineer colloidal particles, we apply direct modification of the photoresist surface either uniformly or selectively through chemical coupling, physical grafting, and selective metal deposition.

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