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Hierarchical Ordering of Block Copolymer Nanostructures by Solvent Annealing Combined with Controlled Dewetting


  • This work was supported by the Korea Research Foundation Grant funded by the Korean Government. (MOEHRD; KRF-2005-042-D00110), Ministry of Commerce, Industry and Energy(MOCEI) through the project of NGNT<(CGS> (No. 10024135-2005-11) and a grant (f0004091) from the Information Display R&D Center, one of the 21st Century Frontier R&D Programs and the 0.1 Terabit Non-volatile Memory Development and Seoul Research and Business Development Program (10701 and 10816). The X-ray experiments at PAL (4C2 beamline), Korea were supported by MOST and POSCO, Korea. This work was supported by the Second Stage of Brain Korea 21 Project in 2006 and by the Seoul Science Fellowship. Supporting Information is available online from Wiley InterScience or from the authors.


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A hierarchical nanostructure of PS-b-PEO is demonstrated (see figure) with a novel approach by solvent vapor annealing of a micropatterned block copolymer thin film selectively spun cast on microcontact printed surface of SAMs. Dewetting of the thin film, inevitable during the ordering of block copolymer microdomains upon solvent annealing, is strictly confined to the patterned regions, leading to the controlled micropatttern with nearly perfect ordering of PEO microdomains.

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