We acknowledge financial support from the “Multifunctional photoactive nanoparticles, nanoparticle arrays, and nanoarchitectures” (PhotoNano) program of the Swedish Foundation for Strategic Research (SSF) and the “Nanostructured photocatalysts for emission cleaning and hydrogen production” program of the Foundation for Strategic Environmental Research (Mistra). We would like to thank Göran Alestig for the help with experiments and Prof. W. E. Smith and A. Hernandez for providing the analyte for SERS measurements. A.D. acknowledges the European Commission's Marie Curie Fellowship grant.
Hole–Mask Colloidal Lithography†
Article first published online: 29 NOV 2007
Copyright © 2007 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Volume 19, Issue 23, pages 4297–4302, December, 2007
How to Cite
Fredriksson, H., Alaverdyan, Y., Dmitriev, A., Langhammer, C., Sutherland, D. S., Zäch, M. and Kasemo, B. (2007), Hole–Mask Colloidal Lithography. Adv. Mater., 19: 4297–4302. doi: 10.1002/adma.200700680
- Issue published online: 29 NOV 2007
- Article first published online: 29 NOV 2007
- Manuscript Revised: 25 JUN 2007
- Manuscript Received: 21 MAR 2007
- Swedish Foundation for Strategic Research (SSF)
- Foundation for Strategic Environmental Research (Mistra)
- Surface patterning
Hole-mask colloidal lithography (HCL) represents a truly versatile and simple bottom-up nanofabrication method based on colloidal self-assembly lithographic patterning. The HCL technique provides an effective means of patterning vast surface areas with diverse functional nanoarchitectures. Examples include arrays of nanodiscs, oriented elliptical nanostructures, (binary) nanodisc pairs, nanocones on extended surfaces and nanodiscs embedded in a surrounding matrix.